Geldrop, Netherlands

Franciscus M Bistervels

This inventor holds 1 USPTO granted patent. Top assignee: O.d.m.e. International B.v.. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Franciscus M Bistervels. Retrieved from https://idiyas.com/inventor/franciscus-m-bistervels

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Franciscus M Bistervels: Innovator in Optical Registration Carriers

Introduction

Franciscus M Bistervels is a notable inventor based in Geldrop, Netherlands. He has made significant contributions to the field of optical registration carriers through his innovative patent. His work focuses on improving the manufacturing processes of molds used in this technology.

Latest Patents

Bistervels holds a patent for a substrate plate designed for the manufacture of a mold for the production of optical registration carriers made from plastic material. This innovative substrate plate utilizes polyether imide as a suitable plastic material, replacing traditional glass. The patent emphasizes the use of injection molding with a highly polished mold to achieve optimal results.

Career Highlights

Bistervels is associated with O.D.M.E. International B.V., where he applies his expertise in developing advanced manufacturing techniques. His work has been instrumental in enhancing the efficiency and quality of optical registration carrier production.

Collaborations

Bistervels collaborates with Johanna H Van Ham, contributing to the innovative projects at O.D.M.E. International B.V. Their partnership exemplifies the synergy between inventors in advancing technology.

Conclusion

Franciscus M Bistervels is a pioneering inventor whose work in optical registration carriers has paved the way for advancements in manufacturing processes. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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