Zhubei, Taiwan

Francis Wang

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2003-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Francis Wang. Retrieved from https://idiyas.com/inventor/francis-wang-u3baeyxt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.1

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Taipei, TW (2003)
  • Zhubei, TW (2008)

Company Filing History:


Years Active: 2003-2008

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2 patents (USPTO):Explore Patents

Title: Innovations by Francis Wang in Semiconductor Technology

Introduction

Francis Wang is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that focus on improving the efficiency and reliability of semiconductor devices.

Latest Patents

One of his latest patents is titled "Hillock reduction in copper films." This invention presents a method for treating the copper surface of a semiconductor device. The process involves exposing the copper surface to a citric acid solution after it has been formed using chemical mechanical polishing (CMP) or other methods. This citric acid treatment can occur during a cleaning operation in a wafer scrubber or afterward. It effectively removes copper oxides that form on exposed surfaces and prevents hillock formation during subsequent high-temperature operations. Following this treatment, the copper surface is annealed, and an NH plasma treatment is applied to further eliminate any remaining copper oxides. This operation also roughens the exposed surfaces, enhancing the adhesion of subsequently formed films, such as a dielectric film, which is preferably created in-situ with the NH plasma treatment. The resulting film is formed over an oxide-free, hillock-free copper surface.

Another significant patent by Wang is a "Semiconductor wafer cleaning method to remove residual contamination including metal nitride particles." This method outlines a process for removing residual contamination, including metal nitride particles, from semiconductor wafer surfaces. The process includes providing at least one semiconductor wafer with metal nitride particles adhering to its surface. The wafer is subjected to a mechanical brushing process while a cleaning solution containing a carboxylic acid is applied. Additionally, the wafer undergoes a sonic cleaning process with the same carboxylic acid cleaning solution.

Career Highlights

Francis Wang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work focuses on enhancing semiconductor manufacturing processes and ensuring high-quality production standards.

Collaborations

Wang has collaborated with several talented individuals in his field, including Shih-Chi Lin and Wen-Long Lee. Their combined expertise contributes to the advancement of semiconductor technologies.

Conclusion

Francis Wang's innovative patents and contributions to semiconductor technology highlight his role as a key inventor in the industry. His work continues to influence the development of more efficient and reliable semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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