Company Filing History:
Years Active: 2017-2019
Title: The Innovations of Francis V Acholla
Introduction
Francis V Acholla is a notable inventor based in New Castle, DE (US). He has made significant contributions to the field of materials science, particularly in the development of technologies related to polishing layers and chemical mechanical polishing pads. With a total of 3 patents, Acholla's work has had a considerable impact on the industry.
Latest Patents
Acholla's latest patents include a "Polishing Layer Analyzer and Method." This innovative analyzer is designed to detect macro inhomogeneities in polymeric sheets and classify them as either acceptable or suspect. Another significant patent is the "Method of Manufacturing Chemical Mechanical Polishing Pads." This method involves an automated inspection system that detects macro inhomogeneities in skived sheets, classifying them similarly, and further processing the acceptable sheets to create polishing layers for chemical mechanical polishing pads.
Career Highlights
Throughout his career, Acholla has worked with prominent companies such as Rohm and Haas, Electronic Materials CMP Holdings, Inc., and Dow Global Technologies LLC. His experience in these organizations has allowed him to refine his expertise and contribute to various innovative projects.
Collaborations
Acholla has collaborated with notable professionals in his field, including Andrew Wank and Mark Gazze. These collaborations have further enhanced his work and led to advancements in the technologies he has developed.
Conclusion
Francis V Acholla's contributions to the field of materials science through his patents and career achievements highlight his role as an influential inventor. His work continues to shape the industry and inspire future innovations.