Francis Goodwin

Title: The Innovations of Francis Goodwin

Introduction

Francis Goodwin is a notable inventor based in Halfmoon, NY (US), recognized for his contributions to semiconductor technology. With a total of six patents to his name, Goodwin has made significant advancements in the field of extreme ultraviolet (EUV) lithography and integrated circuit structures.

Latest Patents

One of Goodwin's latest patents focuses on the development of an extreme ultraviolet (EUV) lithography mask. This patent details a semiconductor structure that includes a reflective layer, a capping material on the reflective layer, a buffer layer on the capping layer, alternating absorber layers on the buffer layer, and a capping layer on top of the alternating absorber layers. Another significant patent involves methods of identifying space within integrated circuit structures as either mandrel space or non-mandrel space. This method includes identifying a space between freestanding spacers and determining whether it is a former mandrel space or a non-mandrel space based on line width roughness.

Career Highlights

Throughout his career, Goodwin has worked with prominent companies in the semiconductor industry, including Infineon Technologies AG and GlobalFoundries Inc. His work has contributed to the advancement of technologies that are crucial for modern electronics.

Collaborations

Goodwin has collaborated with notable colleagues such as Lei Sun and Obert Reeves Wood II, further enhancing his contributions to the field.

Conclusion

Francis Goodwin's innovative work in semiconductor technology and his numerous patents highlight his significant impact on the industry. His advancements in EUV lithography and integrated circuit structures continue to influence the future of electronics.