Francesco M De Rege

Title: Francesco M De Rege: Innovator in Polishing Systems

Introduction

Francesco M De Rege is a notable inventor based in Naperville, IL (US). He has made significant contributions to the field of polishing systems, holding a total of 2 patents. His work focuses on innovative methods and systems that enhance the polishing process for various substrates.

Latest Patents

Francesco's latest patents include an alkali metal-containing polishing system and method. This invention provides a polishing system that comprises a liquid carrier, an alkali metal ion, a compound with an amine group and at least one polar moiety, and a polishing pad or abrasive. The system is designed to achieve a total ion concentration above the critical coagulation concentration. Additionally, he has developed a CMP method for noble metals, which involves polishing a substrate by contacting it with a CMP system that includes an abrasive, a liquid carrier, and optional polishing additives.

Career Highlights

Francesco M De Rege is currently employed at Cabot Microelectronics Corporation, where he continues to innovate in the field of polishing technologies. His expertise and inventions have contributed to advancements in the industry, particularly in the area of chemical mechanical polishing.

Collaborations

Francesco has collaborated with notable coworkers such as Vlasta A Brusic and Kevin J Moeggenborg. Their combined efforts have led to the development of cutting-edge polishing solutions that benefit various applications.

Conclusion

Francesco M De Rege is a distinguished inventor whose work in polishing systems has made a significant impact in the field. His innovative patents and collaborations highlight his commitment to advancing technology in this area.