Company Filing History:
Years Active: 2005-2008
Title: Forest Chen: Innovator in Semiconductor Technology
Introduction
Forest Chen is a notable inventor based in Boise, ID (US), recognized for his contributions to semiconductor technology. He holds a total of 4 patents, showcasing his innovative approach to enhancing electronic components.
Latest Patents
Chen's latest patents focus on semiconductor device precursor structures for double-sided capacitors. One of his significant inventions involves a method of forming a double-sided capacitor using sacrificial structures, such as sacrificial liners or plugs. This method includes forming a sacrificial liner along the sidewalls of openings in an insulating layer on a semiconductor wafer. A first conductive layer is then created over the sacrificial liner, which is selectively removed to expose the first surface of the conductive layer without damaging other components on the wafer. This process results in an open space adjacent to the first surface, where a dielectric layer and a second conductive layer are formed, ultimately producing the double-sided capacitor. Additionally, methods for increasing capacitance and creating contacts are also disclosed in his patents.
Career Highlights
Forest Chen is currently employed at Micron Technology Incorporated, a leading company in semiconductor manufacturing. His work has significantly impacted the development of advanced semiconductor devices, contributing to the efficiency and performance of electronic products.
Collaborations
Chen has collaborated with notable colleagues, including Fred D. Fishburn and John M. Drynan, enhancing the innovation process through teamwork and shared expertise.
Conclusion
Forest Chen's innovative work in semiconductor technology and his contributions to the field through his patents highlight his role as a key inventor in the industry. His methods for improving double-sided capacitors are paving the way for advancements in electronic components.