This inventor holds 1 USPTO granted patent. Top assignee: Endeas Oy. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Folke Stenman: Innovator in Radiation Modification Technology
Introduction
Folke Stenman is a notable inventor based in Helsinki, Finland. He has made significant contributions to the field of radiation technology, particularly through his innovative methods for modifying irradiance distribution. His work is essential for applications that require precise control over radiation exposure.
Latest Patents
Stenman's most recent patent is titled "Method and device for modifying the irradiance distribution of a radiation source." This invention focuses on a method and apparatus designed to alter the irradiation distribution of a radiation source. The method involves directing radiation to an essentially planar target surface. To achieve the desired effect, several transparent plates are strategically placed between the radiation source and the target surface. These plates utilize reflection and absorption to attenuate radiation to specific areas, enhancing the efficiency of the radiation application.
Career Highlights
Folke Stenman is associated with Endeas Oy, where he continues to develop and refine his innovative technologies. His work at the company has positioned him as a key figure in the advancement of radiation modification techniques. Stenman's dedication to research and development has led to significant advancements in the field.
Collaborations
Stenman collaborates with Jaakko Hyvarinen, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the exploration of new ideas and technologies.
Conclusion
Folke Stenman is a pioneering inventor whose work in radiation modification technology has the potential to impact various industries. His innovative methods and dedication to research continue to drive advancements in this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile