The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 02, 2004
Filed:
Apr. 27, 2001
Applicant:
Inventors:
Jaakko Hyvarinen, Espoo, FI;
Folke Stenman, Helsinki, FI;
Assignee:
Endeas Oy, Espoo, FI;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21S 2/00 ;
U.S. Cl.
CPC ...
F21S 2/00 ;
Abstract
The invention is related to a method and apparatus for modifying the irradiation distribution of a radiation source. In accordance with the method the radiation source ( ) is used to direct radiation to an essentially planar target surface ( ). In accordance with the invention between the radiation source ( ) and the target surface ( ), several plates ( ), which are essentially transparent to the radiation and have spaces between them, are placed close to the radiation source ( ), in order to use the reflection and absorption of the transparent plates ( ) to attenuate the radiation to desired areas.