Aalen, Germany

Ferdinand Djuric-Rissner


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovations of Ferdinand Djuric-Rissner in Semiconductor Lithography

Introduction

Ferdinand Djuric-Rissner is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the area of projection exposure systems for lithography. His innovative work has led to the development of a unique optical arrangement that enhances the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Djuric-Rissner holds one patent titled "Projection exposure system for semiconductor lithography having an optical arrangement." This patent describes a projection exposure apparatus that includes an optical arrangement with an optical element featuring an optically effective surface. The design incorporates an actuator embedded within the optical element, which is strategically placed outside the optically effective surface. This configuration allows for the deformation of the optically effective surface, thereby improving the performance of the lithography system.

Career Highlights

Ferdinand Djuric-Rissner is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and semiconductor manufacturing. His work at this esteemed organization has positioned him as a key player in advancing lithography technologies. Djuric-Rissner's expertise and innovative mindset have contributed to the company's reputation for excellence in the semiconductor industry.

Collaborations

Throughout his career, Djuric-Rissner has collaborated with talented professionals, including Judith Fingerhuth and Norbert Wabra. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Ferdinand Djuric-Rissner's contributions to semiconductor lithography exemplify the impact of innovation in technology. His patent and work at Carl Zeiss SMT GmbH highlight his commitment to advancing the field and improving manufacturing processes. His achievements serve as an inspiration for future inventors in the industry.

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