Carl Zeiss Smt Gmbh

Ferdinand Djuric-Rissner

Norbert Wabra

Sonja Schneider

Peter Graf

Reimar Finken

Judith Fingerhuth

A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.

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Aalen, Germany

Ferdinand Djuric-Rissner