Tainan, Taiwan

Feng-Ru Chang


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 68(Granted Patents)


Company Filing History:


Years Active: 2003-2005

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2 patents (USPTO):Explore Patents

Title: Innovations of Feng-Ru Chang

Introduction

Feng-Ru Chang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of microelectronics, particularly through his innovative patent applications. With a total of 2 patents, his work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Feng-Ru Chang's latest patents include a method for plasma etching a wafer after backside grinding. This method incorporates an oxidation pretreatment step, which begins with grinding the backside of a wafer to expose a bare silicon surface. The bare silicon surface is then oxidized to form a uniform silicon oxide layer, which is crucial for the subsequent plasma etching process. This innovative technique is particularly useful for removing organic material layers, such as photoresist layers, from wafer surfaces.

Another significant patent is related to a microelectronic device that includes a substrate with a top metal layer and a first passivation layer. This device features a via defined by the passivation layer, which overlies the top metal layer. The design includes a dielectric spacer and an electrically conductive redistribution layer, enhancing the device's functionality and efficiency.

Career Highlights

Feng-Ru Chang is currently associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to contribute to cutting-edge technologies and innovations in microelectronics.

Collaborations

Feng-Ru Chang has collaborated with notable colleagues, including Hung-Che Liao and Chin-Kang Lee. These collaborations have fostered a productive environment for innovation and development in their respective fields.

Conclusion

Feng-Ru Chang's contributions to the field of microelectronics through his patents and collaborations highlight his role as a significant inventor. His innovative methods and designs continue to influence the semiconductor industry, showcasing the importance of research and development in technology.

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