Feng Bai

Title: Innovations of Feng Bai in Lithography

Introduction

Feng Bai is a notable inventor based in Shanghai, China. He has made significant contributions to the field of lithography, particularly in the development of mask patterns and their correction methods. With a total of 2 patents, his work has advanced the quality and efficiency of semiconductor manufacturing.

Latest Patents

Feng Bai's latest patents include innovative methods for correcting mask patterns. One patent describes a method that involves providing a target layout with multiple main patterns. This method divides the layout into several regions, acquires position information, and arranges auxiliary patterns around the main patterns based on specific parameters. Another patent focuses on assistant pattern configuration methods, which enhance lithographic quality by optimizing focal planes and adjusting configuration parameters accordingly.

Career Highlights

Feng Bai has worked with prominent companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to apply his innovative ideas in practical settings, contributing to advancements in lithographic technology.

Collaborations

Feng Bai has collaborated with notable colleagues such as Wanjuan Zhang and Yibin Huang. Their teamwork has fostered an environment of innovation and has led to the successful development of new technologies in the field.

Conclusion

Feng Bai's contributions to lithography through his patents and career in semiconductor manufacturing highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and improve manufacturing processes.