Fei Wu

Title: Fei Wu: Innovator in Semiconductor Processing and Machine Learning

Introduction

Fei Wu is a notable inventor based in Sunnyvale, CA, with a focus on advancements in semiconductor processing and machine learning technologies. He holds a total of 6 patents, showcasing his contributions to these fields.

Latest Patents

Among his latest patents is a method for chamber configurations and processes for particle control. This innovative approach involves forming a plasma of a cleaning precursor in a remote region of a semiconductor processing chamber. The method includes flowing plasma effluents into the processing region and contacting a substrate support with these effluents for a specified duration. Additionally, the process entails lowering the substrate support while continuing to flow the plasma effluents, ultimately cleaning the processing region for a designated time.

Another significant patent by Fei Wu is related to the automatic partitioning of machine learning models for training across multiple devices. This method allows for the optimization of training jobs by specifying the number of partitions for a machine learning model. It determines the respective partitions based on optimization parameters and generates a schedule for executing the training job accordingly.

Career Highlights

Fei Wu has made significant strides in his career, having worked with prominent companies such as Applied Materials, Inc. and Amazon Technologies, Inc. His experience in these organizations has contributed to his expertise in semiconductor technologies and machine learning applications.

Collaborations

Fei Wu has collaborated with various professionals in his field, including Abdul Aziz Khaja and Sungwon Ha, who have contributed to his innovative projects and research endeavors.

Conclusion

Fei Wu's contributions to semiconductor processing and machine learning exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving processes and methodologies in these critical areas.