Fei Ding

Title: Fei Ding: Innovator in Nanotechnology

Introduction

Fei Ding is a prominent inventor based in Princeton, NJ (US), known for his contributions to the field of nanotechnology. He holds 2 patents that showcase his innovative approaches to creating advanced optical devices and nanostructures.

Latest Patents

One of his latest patents is titled "Methods for creating large-area complex nanopatterns for nanoimprint molds." This invention provides methods that can create large area complex patterns for nanoimprint molds with minimal use of charged beam or photon beam direct-writing of nanostructures. The methods include Fourier nanoimprint patterning (FNP), edge-guided nanopatterning (EGN), and nanostructure self-perfection, among their combinations. Another significant patent is "Subwavelength structured lens having moire pattern, use and methods of making the same." This invention relates to optical lenses that utilize subwavelength structures to perform optical functions. The subwavelength Moiré index lens (SMIL) allows for ultrathin, flat lenses with a numerical aperture nearly one, scalable to large areas, and manufacturable at low cost.

Career Highlights

Fei Ding has worked at Princeton University, where he has contributed to various research projects and advancements in nanotechnology. His work has significantly impacted the development of optical devices and nanostructures.

Collaborations

Fei Ding has collaborated with notable individuals in his field, including Stephen Y Chou and Wei Ding. Their joint efforts have furthered research and innovation in nanotechnology.

Conclusion

Fei Ding's innovative work in nanotechnology and his patents reflect his commitment to advancing the field. His contributions are paving the way for new optical devices and applications that could revolutionize various industries.