The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Nov. 29, 2023
Applicant:
The Trustees of Princeton University, Princeton, NJ (US);
Inventors:
Stephen Y. Chou, Princeton, NJ (US);
Fei Ding, Princeton, NJ (US);
Assignee:
THE TRUSTEES OF PRINCETON UNIVERSITY, Princeton, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/65 (2006.01); B29C 33/56 (2006.01); B29C 37/00 (2006.01); B29C 59/02 (2006.01); G01N 21/64 (2006.01); G03F 7/00 (2006.01); B29C 33/42 (2006.01);
U.S. Cl.
CPC ...
G01N 21/658 (2013.01); B29C 33/56 (2013.01); B29C 37/0003 (2013.01); B29C 59/02 (2013.01); B29C 59/026 (2013.01); G01N 21/648 (2013.01); G01N 21/6486 (2013.01); G03F 7/0002 (2013.01); B29C 33/424 (2013.01); B29C 2059/023 (2013.01); B29K 2995/0005 (2013.01);
Abstract
Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.