Location History:
- Bearverton, OR (US) (2012)
- Bellevue, WA (US) (2013)
- Beaverton, OR (US) (2007 - 2022)
Company Filing History:
20 out of 672 
1 out of 210 
3 out of 832,843 Years Active: 2007-2022
Title: Innovations of Fedor G. Pikus: A Leading Mind in Photolithographic Design
Introduction: Fedor G. Pikus, an accomplished inventor based in Beaverton, Oregon, has made significant contributions to the field of layout design and photolithography. With an impressive portfolio that includes 24 patents, Pikus has demonstrated his expertise in developing advanced systems and methods that enhance design processes for various applications.
Latest Patents: Among his most recent innovations are two notable patents. The first, titled "Systems and methods for photolithographic design," outlines a method for identifying elements in a design layout comprised of multiple levels of hierarchical cells. This innovative approach utilizes local rules to streamline the selection of geometric elements across varying levels of hierarchy, ultimately producing a global solution.
The second patent, "Systems and methods for patterning color assignment," focuses on multi-patterning in layout design data. This method leverages computer systems to apply coloring rules to identify unique uncolored geometric elements and iteratively refines the coloring process until successful assignments are made. These contributions reflect Pikus's commitment to enhancing efficiency and precision in design methodologies.
Career Highlights: Throughout his career, Fedor G. Pikus has excelled in the technology sector, working with renowned companies such as Mentor Graphics Corporation. His work has had a lasting impact on the industry, showcasing a blend of creativity and technical skill that facilitates innovation in design processes.
Collaborations: Collaboration has played a key role in Pikus's achievements. Notable colleagues, including Laurence W. Grodd and John G. Ferguson, have partnered with him on various projects, contributing to the advancement of technologies in photolithography and layout design. Their combined expertise fosters an environment of brainstorming and creative problem-solving, ultimately leading to groundbreaking inventions.
Conclusion: As an inventor with a remarkable body of work, Fedor G. Pikus continues to push the boundaries of innovation in photolithographic design and layout methodologies. His latest patents provide insight into the future of design technology, paving the way for ongoing advancements in the field. Pikus’s dedication to enhancing and refining design processes will undoubtedly leave a lasting legacy within the industry.