Tehran, Iran

Farshid Rostami Pouria

This inventor holds 1 USPTO granted patent and 3 published patent applications. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Farshid Rostami Pouria. Retrieved from https://idiyas.com/inventor/farshid-rostami-pouria

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Farshid Rostami Pouria: Inventor in Electroporation Technology

Introduction

Farshid Rostami Pouria is an inventor based in Tehran, Iran. His patent work addresses electroporation in sensitive or difficult-to-access regions of the body.

Latest Patents

The supplied information identifies one patent for Pouria: “Electroporation/electrochemotherapy of surgically sensitive regions.” The invention describes devices and methods for electroporating target cells in vivo using non-invasive structured electrodes positioned at or near the target region. Electrical voltage pulses are applied between electrodes to treat the target cells while aiming to avoid bleeding, tearing, or other injuries. The disclosed approach may use a camera to track electrode placement and a vacuum pressure generator to improve contact between the electrodes and the target region. Pouria’s listed patent count is 1 patent.

Career Highlights

Pouria’s identified patent focuses on adapting electroporation and electrochemotherapy for surgically sensitive areas and locations that are difficult to reach. The described techniques combine electrode positioning, pulse delivery, visual tracking, and vacuum-assisted contact.

Collaborations

The supplied information lists Mohammad Abdolahad and Mohammad Ali Khayamian as Pouria’s coworkers.

Conclusion

Farshid Rostami Pouria’s patent work centers on device-assisted electroporation designed for sensitive and difficult-to-access regions, with an emphasis on controlled electrode placement and contact.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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