Chandler, AZ, United States of America

Fanyi Zhu

This inventor holds 1 USPTO granted patent and 5 published patent applications. Top assignee: Intel Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fanyi Zhu. Retrieved from https://idiyas.com/inventor/fanyi-zhu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Fanyi Zhu - Innovator in Material Deposition Technology

Introduction

Fanyi Zhu is a notable inventor based in Chandler, AZ (US). He has made significant contributions to the field of material deposition technology. His innovative approach has led to the development of a unique method and apparatus for material deposition.

Latest Patents

Fanyi Zhu holds a patent for a "Material deposition method and material deposition apparatus." This patent describes a method that includes providing a substrate and applying a layer of material in a solid form onto it. The solid material loosely interfaces with the substrate, and the method involves irradiating the material with light to melt it into a liquid form at specific areas of the substrate. Finally, the liquid material is cooled to form a solidified pattern that adheres to the substrate.

Career Highlights

Fanyi Zhu is currently employed at Intel Corporation, where he continues to work on innovative technologies. His expertise in material deposition has positioned him as a valuable asset to the company.

Collaborations

Fanyi Zhu collaborates with Hanyu Song, contributing to advancements in their field through shared knowledge and expertise.

Conclusion

Fanyi Zhu's work in material deposition technology exemplifies innovation and creativity in engineering. His contributions are paving the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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