Fangxin Tian

Title: Innovations by Fangxin Tian in Metal Film Measurement

Introduction

Fangxin Tian is a notable inventor based in Beijing, China. He has made significant contributions to the field of technology, particularly in the measurement of metal films. His innovative approach has led to the development of a unique method that enhances the precision of thickness measurements in various applications.

Latest Patents

Fangxin Tian holds a patent for a "Method for determining thickness of metal film of wafer, polishing device, and medium." This patent describes a comprehensive method for measuring the thickness of a metal film. The process involves determining a reference thickness based on measurement signals that indicate the thickness at different positions on the metal film. Additionally, it includes the determination of sub-adjustment parameters based on the reference thickness, which correspond to the topographies of different edges of the metal film. The method ultimately allows for precise adjustments in the processing of the metal film, ensuring accurate thickness determination.

Career Highlights

Fangxin Tian is currently employed at Hwatsing (Beijing) Technology Co., Ltd. His work at this company has been instrumental in advancing technologies related to metal film measurement. With a focus on innovation, he continues to contribute to the field through his research and development efforts.

Collaborations

Fangxin Tian collaborates with talented individuals such as Xinchun Lu and Yingming Wu. Their combined expertise fosters a creative environment that enhances the development of new technologies and solutions.

Conclusion

Fangxin Tian's contributions to the field of metal film measurement exemplify the importance of innovation in technology. His patented method not only improves measurement accuracy but also showcases the potential for advancements in related industries.