Fang-Yu Chang

Title: The Innovations of Fang-Yu Chang

Introduction

Fang-Yu Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on electrostatic discharge protection devices, which are crucial for the reliability of electronic components.

Latest Patents

Fang-Yu Chang holds a patent for an electrostatic discharge (ESD) protection device and layout design. This innovative device is designed for semiconductor applications and includes a gate, a source with a silicide portion featuring multiple source contacts, and a drain with a silicide portion containing several drain contacts. The design ensures that the source and drain extend away from the gate along a device axis. Additionally, the ESD device incorporates a resist protective oxide (RPO) portion located strategically on the semiconductor device, enhancing its protective capabilities.

Career Highlights

Fang-Yu Chang is currently employed at Elite Semiconductor Memory Technology, Inc. His role at the company allows him to apply his expertise in semiconductor technology and contribute to advancements in the field. His innovative approach has led to the development of critical technologies that enhance the performance and durability of electronic devices.

Collaborations

Fang-Yu Chang has collaborated with several talented individuals in his field, including Chien-Shao Tang and Ting-Jui Lin. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Fang-Yu Chang's contributions to semiconductor technology, particularly in electrostatic discharge protection, highlight his role as a key inventor in the industry. His patent and work at Elite Semiconductor Memory Technology, Inc. demonstrate his commitment to advancing technology and improving electronic device reliability.