Company Filing History:
Years Active: 2006-2008
Title: Innovations of Fang Tian in Semiconductor Technology
Introduction
Fang Tian is a notable inventor based in Fremont, CA, who has made significant contributions to the field of semiconductor technology. With a total of 3 patents to his name, he has developed innovative methods that enhance the fabrication of interconnect structures in integrated circuits.
Latest Patents
Fang Tian's latest patents include a method of forming a low-K dual damascene interconnect structure. This method involves etching a via into an upper low K dielectric layer and into a hardened portion of a lower low K dielectric layer. The process is defined by a pattern formed in a photoresist layer, which is subsequently stripped. A trench that circumscribes the via is then etched into the upper low K dielectric layer, while the via in the lower low K dielectric layer is further etched. The result is a low K dielectric dual damascene structure. Another significant patent is focused on selective etching of carbon-doped low-k dielectrics. This invention includes a process for selectively etching a low-k dielectric material using a plasma of a gas mixture in a plasma etch chamber. The gas mixture comprises a fluorine-rich fluorocarbon or hydrofluorocarbon gas, a nitrogen-containing gas, and one or more additive gases. This process achieves a low-k dielectric to photoresist mask etching selectivity ratio greater than about 5:1 and a low-k dielectric etch rate higher than about 4000 Å/min.
Career Highlights
Fang Tian is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on advancing technologies that improve the efficiency and performance of semiconductor manufacturing processes.
Collaborations
Fang has collaborated with several talented individuals in his field, including Yan Ye and Neungho Shin, who contribute to the innovative environment at Applied Materials, Inc.
Conclusion
Fang Tian's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the industry. His advancements in low-K dielectric structures and etching processes are paving the way for future developments in semiconductor manufacturing.