Company Filing History:
Years Active: 2016
Title: Fang-Hong Yao: Innovator in Metal Gate Structures
Introduction
Fang-Hong Yao is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of metal gate structures.
Latest Patents
Fang-Hong Yao holds a patent for a "Metal gate structure and method of forming the same." This invention provides a metal gate structure formed in a trench of a dielectric layer. The structure includes a work function metal layer and a metal layer. The work function metal layer is disposed in the trench and comprises a bottom portion and a side portion, with a thickness ratio between the two portions ranging from 2 to 5. The trench is filled with the metal layer, and the invention also outlines a method for forming this metal gate structure. He has 1 patent to his name.
Career Highlights
Fang-Hong Yao is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in advancing technologies that are crucial for modern electronic devices.
Collaborations
Fang-Hong Yao has collaborated with notable colleagues, including Chi-Ju Lee and Yao-Chang Wang, contributing to various projects within the semiconductor field.
Conclusion
Fang-Hong Yao's innovative work in metal gate structures showcases his expertise and commitment to advancing semiconductor technology. His contributions continue to impact the industry significantly.