This inventor holds 2 USPTO granted patents. Top assignee: University of Electronic Science and Technology of China. Active years: 2022-2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022-2023
Title: Innovations of Fan Lin in Integrated Circuit Technology
Introduction
Fan Lin is a prominent inventor based in Chengdu, China, known for his contributions to microelectronic technology and integrated circuits. With a total of two patents to his name, he has made significant advancements in the field of integrated circuit structures.
Latest Patents
One of Fan Lin's latest patents is the "Nano-wall integrated circuit structure with high integrated density." This invention relates to microelectronic technology and integrated circuits (IC). The nano-wall integrated circuit unit structure, referred to as NWaFET, offers a high integration density that improves the overall performance of ICs. It significantly shortens the channel length and enhances the flexibility of the device channel width-to-length ratio adjustment, ultimately saving chip area.
Another notable patent is the "Metal oxide semiconductor integrated circuit basic unit." This patent describes a MOS integrated circuit basic unit that includes various components such as a drain semiconductor region, a lightly doped drain region, a channel semiconductor region, and a source semiconductor region. The design features a ring structure for the gate electrode, which surrounds the channel and source regions, ensuring efficient functionality.
Career Highlights
Fan Lin is affiliated with the University of Electronic Science and Technology of China, where he continues to engage in innovative research and development in the field of integrated circuits. His work has garnered attention for its potential applications in advancing microelectronic technology.
Collaborations
Fan Lin has collaborated with notable colleagues, including Ping Li and Yongbo Liao, contributing to various projects and research initiatives in the field of integrated circuits.
Conclusion
Fan Lin's innovative work in integrated circuit technology showcases his expertise and commitment to advancing the field. His patents reflect significant contributions that may influence future developments in microelectronics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile