This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Innovations of Fan-Keng Yang in Semiconductor Technology
Introduction
Fan-Keng Yang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of chemical mechanical polishing (CMP) processes. With a total of 2 patents, his work has advanced the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
Yang's latest patents include a "Headless CMP process for oxide planarization" and a "Method for forming a passivation layer on copper conductive elements." The headless CMP process provides a method for planarizing an oxide surface and effectively removing dishing or erosion defects from semiconductor wafers. This innovative method involves rotating a wafer at speeds of at least 1000 RPM while injecting a solvent/abrasive mixture to eliminate metal residues and defects. The process allows for precise control of the rotational speed, ranging from 1000 RPM to 10,000 RPM, and utilizes diluted HF and aluminum oxide as suitable materials.
The second patent focuses on forming a passivation layer on copper conductive elements within semiconductor structures. This method involves creating a stepped or corrugated surface between the copper conductor and the insulating layer, ensuring a strong mechanical interlock when the passivation layer is deposited. This innovation helps prevent adhesion failure or peeling of the passivation layer, enhancing the reliability of semiconductor devices.
Career Highlights
Fan-Keng Yang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has positioned him at the forefront of technological advancements in the industry. His expertise in CMP processes has been instrumental in improving the quality and performance of semiconductor devices.
Collaborations
Yang has collaborated with esteemed colleagues such as Tze-Liang Lee and Chen-Hwa Yu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.
Conclusion
Fan-Keng Yang's contributions to semiconductor technology through his innovative patents demonstrate his commitment to advancing the industry. His work not only enhances manufacturing processes but also ensures the reliability of semiconductor devices. His achievements reflect the importance of innovation in technology and its impact on the future of electronics.