McKinney, TX, United States of America

Fan Chi Hou

This inventor holds 1 USPTO granted patent. Top assignee: Texas Instruments Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fan Chi Hou. Retrieved from https://idiyas.com/inventor/fan-chi-hou-3spti5jm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Fan Chi Hou

Introduction

Fan Chi Hou is a notable inventor based in McKinney, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of methods to enhance the performance of metal oxide semiconductor (MOS) devices. His work is characterized by a focus on reducing noise in electronic components, which is crucial for improving the reliability and efficiency of various electronic applications.

Latest Patents

Fan Chi Hou holds a patent titled "Method for manufacturing a MOS transistor having reduced 1/f noise." This invention provides a method to reduce 1/f noise in a MOS device. The process involves forming an oxide layer on a silicon substrate and depositing a polysilicon layer on top of the oxide layer. A fluorine dopant is then implanted into the polysilicon layer at a specific dose. The polysilicon layer undergoes thermal annealing, allowing a portion of the fluorine dopant to diffuse into the oxide layer, thereby reducing the 1/f noise of the MOS device. This innovative approach not only enhances the performance of MOS devices but also contributes to the manufacturing of integrated circuits.

Career Highlights

Fan Chi Hou is associated with Texas Instruments Corporation, a leading company in the semiconductor industry. His work at Texas Instruments has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of technology in electronic devices. With a patent portfolio that includes 1 patent, he has established himself as a valuable asset in the field of semiconductor research and development.

Collaborations

Throughout his career, Fan Chi Hou has collaborated with notable colleagues, including Pinghai Hao and Larry B Anderson. These collaborations have likely fostered an environment of innovation and creativity, leading to advancements in semiconductor technology.

Conclusion

Fan Chi Hou's contributions to the field of semiconductor technology, particularly through his patented methods for reducing noise in MOS devices, highlight his role as an influential inventor. His work at Texas Instruments Corporation and collaborations with esteemed colleagues further emphasize his impact on the industry. The advancements he has made continue to shape the future of electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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