This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2025-2026.
Company Filing History:
1 out of 463 
1 out of 42,759 
Years Active: 2025-2026
Title: Innovations by Fan-Cheng Lin in Semiconductor Technology
Introduction
Fan-Cheng Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique method for forming semiconductor devices.
Latest Patents
Fan-Cheng Lin holds a patent for a method titled "Method for forming semiconductor device with monoclinic crystalline metal oxide capping layer." This method involves several intricate steps, including the formation of a semiconductor fin, the deposition of metal oxide layers, and the transformation of these layers from amorphous to crystalline structures through an annealing process. This innovative approach enhances the performance and reliability of semiconductor devices.
Career Highlights
Fan-Cheng Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the field.
Collaborations
He has collaborated with talented coworkers, including Po-Kai Hsiao and Tsai-Yu Huang. Their combined expertise has fostered a productive environment for innovation and development.
Conclusion
Fan-Cheng Lin's contributions to semiconductor technology exemplify the spirit of innovation. His patented methods are paving the way for future advancements in the industry.