Voiron, France

Fabrice Gritti

This inventor holds 2 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignee: Soitec. Active years: 2012-2015.

USPTO Granted Patents = 2 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2012-2015

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2 patents (USPTO):Explore Patents

Title: Innovations by Fabrice Gritti

Introduction

Fabrice Gritti is a notable inventor based in Voiron, France. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, his work focuses on processes that enhance the performance and reliability of semiconductor-on-insulator structures.

Latest Patents

Fabrice Gritti's latest patents include a process to dissolve the oxide layer in the peripheral ring of a semiconductor-on-insulator type structure. This innovative process aims to avoid the formation of an Si—SiO—H environment during the dissolution treatment. It involves encapsulating the exposed oxide layer with semiconductor material and performing a thermal treatment to facilitate oxide dissolution. His second patent details a method for locally dissolving the oxide layer in a semiconductor-on-insulator structure. This process utilizes a silicon nitride or silicon oxynitride mask to define exposed areas on the thin semiconductor layer, allowing for controlled reduction of the oxide thickness.

Career Highlights

Fabrice Gritti is currently employed at Soitec, a company renowned for its advancements in semiconductor materials. His work at Soitec has positioned him as a key player in the development of innovative semiconductor technologies.

Collaborations

Fabrice collaborates with talented coworkers, including Christelle Veytizou and Eric Guiot. Their combined expertise contributes to the success of their projects and the advancement of semiconductor technology.

Conclusion

Fabrice Gritti's contributions to semiconductor technology through his innovative patents and work at Soitec highlight his importance in the field. His dedication to improving semiconductor structures continues to influence advancements in technology.

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