This inventor holds 1 USPTO granted patent. Top assignee: Commissariat a L'energie Atomique Et Aux Energies Alternatives. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Fabrice Amy: Silicon-Layer Invention
Introduction
Fabrice Amy is an inventor based in Andrésy, France. His work includes a patent for a silicon layer designed to be highly sensitive to oxygen, with potential applications in microelectronics.
Latest Patents
Amy is associated with 1 patent: “Silicon Layer Highly Sensitive to Oxygen and Method for Obtaining Same.” The invention describes depositing a substantially uniform silicon layer on a substrate, such as silicon carbide. The layer has a 4×3 surface structure and is designed to be highly sensitive to oxygen. The patent identifies microelectronics as one possible application.
Career Highlights
Amy is associated with the Commissariat à l’Énergie Atomique et aux Énergies Alternatives, a French research organization. His patent reflects work on silicon materials and their potential use in electronic technologies.
Collaborations
The supplied information names Christian Brylinski and Andrew Mayne as Amy’s coworkers. Their shared association points to a collaborative research environment, though specific joint projects are not provided.
Conclusion
Fabrice Amy’s documented invention focuses on an oxygen-sensitive silicon layer and its potential microelectronics applications, highlighting his contribution to materials research.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile