Stanford, CA, United States of America

Evan W Wang

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Leland Stanford Junior University. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Evan W. Wang

Introduction

Evan W. Wang is a notable inventor based in Stanford, California. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the functionality and yield of semiconductor devices through innovative methods.

Latest Patents

Evan W. Wang holds a patent for "Matrix-based characterization and measurements for semiconductor thin-film material." This patent addresses methods for detecting anomalies in semiconductor thin-film materials, such as strains and defects. These anomalies can adversely impact device functionality and processing yields. The methods described in the patent utilize filtering optics to provide filter-separated light beams associated with different polarization states. This approach allows for the analysis of the types and severities of anomalies, enabling the remediation of related defects.

Career Highlights

Evan W. Wang is affiliated with Leland Stanford Junior University, where he continues to advance research in semiconductor materials. His work has implications for enhancing the reliability and efficiency of semiconductor processing.

Collaborations

Evan collaborates with talented individuals such as Thaibao Phan and Jonathan A. Fan. Their combined expertise contributes to the innovative research being conducted at their institution.

Conclusion

Evan W. Wang's contributions to semiconductor technology through his patent and collaborative efforts highlight his role as an influential inventor in the field. His work continues to pave the way for advancements in semiconductor processing and device functionality.

Profile summary based on public USPTO records.
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