This inventor holds 1 USPTO granted patent. Top assignee: Fei Comapny. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Eva Št'astná: Innovator in Charged Particle Microscopy
Introduction
Eva Št'astná is a prominent inventor based in Šardice, Czech Republic. She has made significant contributions to the field of charged particle microscopy. Her innovative work has led to the development of a unique detector that enhances the capabilities of this technology.
Latest Patents
Eva holds a patent for a "Shielded detector for charged particle microscopy." This invention describes systems, components, and methods for detecting characteristic signals. The detector includes a detector cell that generates an electrical signal in response to a particle incident on an active layer. The active layer defines an absorption surface, and the detector incorporates a filter made of carbon material. This filter shields the absorption surface from a subset of incident particles, including electrons, ions, and photons with energy less than about 40 eV. Eva's patent represents a significant advancement in the detection capabilities of charged particle microscopy, with 1 patent to her name.
Career Highlights
Eva has established herself as a key figure in her field through her innovative work at Fei Company. Her expertise in charged particle microscopy has positioned her as a valuable asset in the research and development of advanced detection systems.
Collaborations
Eva collaborates with notable colleagues, including Petr Hlavenka and Vojtěch Mahel. Their combined efforts contribute to the advancement of technology in their field.
Conclusion
Eva Št'astná is a remarkable inventor whose work in charged particle microscopy has led to significant advancements in detection technology. Her contributions continue to influence the field and inspire future innovations.