Gyeonggi-do, South Korea

Eunshoo Han

This inventor holds 1 USPTO granted patent and 5 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Eunshoo Han: Innovator in Semiconductor Technology

Introduction

Eunshoo Han is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the methods of forming fine patterns for semiconductor devices. His innovative approaches have garnered attention in the industry.

Latest Patents

Eunshoo Han holds 1 patent for his work titled "Methods of forming fine patterns for semiconductor devices." This patent outlines a method that includes sequentially forming a lower layer and a mask layer with first openings on a substrate. The process involves forming pillars that fill the first openings and protrude upward from the mask layer's top surface. Additionally, it describes the formation of a block copolymer layer on the substrate with the pillars, followed by thermal treatment to create distinct block portions. The method further details the removal of certain block portions to expose the mask layer and etching it to form second openings.

Career Highlights

Eunshoo Han is currently employed at Samsung Electronics Co., Ltd., where he continues to advance semiconductor technologies. His work has been instrumental in enhancing the efficiency and precision of semiconductor manufacturing processes.

Collaborations

Eunshoo has collaborated with notable colleagues, including SoonMok Ha and Seongho Moon, contributing to various projects within the semiconductor field.

Conclusion

Eunshoo Han's innovative work in semiconductor technology exemplifies the importance of advancements in this critical industry. His contributions continue to shape the future of semiconductor devices and manufacturing processes.

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