EunKee Hong

Title: EunKee Hong and Metal-Containing Film Innovations.

Introduction

EunKee Hong is an inventor based in Santa Clara, California, whose patent work addresses materials and processes for electronic devices. He is associated with Applied Materials, Inc., a company that develops equipment and technologies for semiconductor manufacturing.

Latest Patents

Hong is named on 1 patent, titled “Methods of Growing Metal-Containing Films.” The patent describes methods for forming metal-containing films for electronic devices, including logic and memory devices, and for reducing the equivalent oxide thickness (EOT) penalty. The disclosed process exposes a substrate surface to a metal precursor, such as titanium chloride, a reducing agent, such as a cyclic 1,4-diene, and ammonia as a reactant. These materials may be introduced simultaneously, partially simultaneously, or separately and sequentially.

Career Highlights

Hong’s patent reflects work on thin-film formation processes relevant to semiconductor device fabrication. The methods focus on controlling film growth while addressing EOT considerations in electronic devices.

Collaborations

Hong’s listed coworkers include Haoming Yan and Shih Chung Chen. The patent’s association with Applied Materials, Inc. places this work within the company’s broader semiconductor manufacturing technology efforts.

Conclusion

EunKee Hong’s patent documents an approach to growing metal-containing films and reducing EOT penalties, highlighting his contribution to semiconductor process innovation.