Gwangmyeong, South Korea

Eun Seok Seo

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eun Seok Seo. Retrieved from https://idiyas.com/inventor/eun-seok-seo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Eun Seok Seo and Semiconductor Substrate Processing

Introduction

Eun Seok Seo is an inventor associated with Gwangmyeong, South Korea, and Samsung Electronics Ltd. The supplied information lists 1 patent in her name, focused on semiconductor substrate processing.

Latest Patents

Seo’s listed patent, “Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same,” describes an apparatus with a heater divided into two units within a support plate. During the transient section—before the substrate reaches a steady-state temperature—processing circuitry controls the units to heat different substrate portions to different temperatures. The patent also concerns methods of manufacturing semiconductor devices using the apparatus.

Career Highlights

The available information connects Seo’s invention to Samsung Electronics Ltd. Her listed patent addresses temperature control during substrate processing, a step relevant to semiconductor device manufacturing.

Collaborations

Jae Hong Lim and Young Ho Hwang are identified as Seo’s coworkers. The supplied information does not specify their roles in the patent or the invention.

Conclusion

Eun Seok Seo’s listed patent presents a semiconductor processing approach that uses independently controlled heater units to apply different temperatures across a substrate during transient heating.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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