Kyunggi-do, South Korea

Eun-Kee Hong


Average Co-Inventor Count = 4.1

ph-index = 5

Forward Citations = 139(Granted Patents)


Location History:

  • Suwon, KR (2002 - 2003)
  • Suwon-si, KR (2003)
  • Gyeonggi-do, KR (2004 - 2008)
  • Kyunggi-do, KR (2007 - 2009)

Company Filing History:


Years Active: 2002-2009

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8 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Eun-Kee Hong

Introduction

Eun-Kee Hong is a prominent inventor based in Kyunggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of eight patents. His work focuses on methods that enhance the efficiency and effectiveness of semiconductor device processing.

Latest Patents

One of his latest patents is a method for forming a silicon oxide layer using spin-on glass. This innovative approach involves applying a spin-on glass (SOG) layer that includes polysilazane to a substrate. The SOG layer is then converted into a silicon oxide layer using an oxidant solution, which may contain various oxidants such as ozone and peroxides. Another notable patent involves methods of filling gaps by deposition on materials with different deposition rates. This method includes forming a pattern to define a gap on a substrate, followed by the formation of a bottom oxide layer that fills the gap. The process is designed to ensure that a top oxide layer is selectively deposited at varying rates, optimizing the filling of gaps in semiconductor devices.

Career Highlights

Eun-Kee Hong is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to contribute to cutting-edge technologies that are essential for modern electronic devices.

Collaborations

Eun-Kee Hong has collaborated with notable colleagues, including Ju-Seon Goo and Hong-Gun Kim. These collaborations have further enhanced the innovative processes and technologies developed in their respective fields.

Conclusion

Eun-Kee Hong's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a key innovator in the industry. His methods for forming silicon oxide layers and filling gaps in substrates are significant advancements that continue to influence the field of semiconductor manufacturing.

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