Eun K Row

Title: Eun K Row: Innovator in Thin Film Technology

Introduction

Eun K Row is a notable inventor based in San Jose, CA, with a focus on advancements in thin film technology. He holds a total of 7 patents, showcasing his contributions to the field of materials science and engineering.

Latest Patents

One of his latest patents is a method for depositing a thin film adhesion layer. This innovative technique utilizes xenon as the operating gas in the vacuum chamber during the deposition of an ultra-thin silicon adhesion layer. The use of xenon improves the durability of the film compared to traditional methods that use argon, which can lead to contamination and reduced adhesion performance. Another significant patent involves a planarization method for structures, which minimizes step heights and enhances cleanliness. This method employs a bi-layer encapsulating film that allows for effective planarization while resisting chemical attacks during processing.

Career Highlights

Eun K Row has worked with prominent companies such as IBM and Hitachi Global Storage Technologies. His experience in these organizations has contributed to his expertise in developing innovative solutions in the field of thin films and materials.

Collaborations

Throughout his career, Eun K Row has collaborated with talented individuals, including Cherngye Hwang and Ning Shi, who have contributed to his research and development efforts.

Conclusion

Eun K Row's work in thin film technology and his innovative patents reflect his significant impact on the industry. His contributions continue to advance the field and inspire future innovations.