This inventor holds 1 USPTO granted patent. Top assignee: Korea Research Institute of Chemical Technology. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Eun-Ho Sohn: Innovator in Fluorine-Based Polymers
Introduction
Eun-Ho Sohn is a prominent inventor based in Yuseong-gu, South Korea. He has made significant contributions to the field of polymer science, particularly with his innovative work on fluorine-based polymers. His research focuses on developing materials with unique properties that can be utilized in various applications.
Latest Patents
Eun-Ho Sohn holds a patent for a fluorine-based polymer with a low dielectric constant. The patent, titled "Fluorine-based polymer with low dielectric constant and fluorine-based polymer composition comprising same," describes a polymer that exhibits a dielectric constant of less than 1.8. This polymer is not only environmentally friendly, generating no harmful substances, but it also possesses high adhesiveness, making it suitable for use as a coating material in diverse fields. Additionally, a polymer film made from this material demonstrates excellent insulating properties, with a volume resistance of about 5.8×10^Ohmcm.
Career Highlights
Eun-Ho Sohn is affiliated with the Korea Research Institute of Chemical Technology, where he continues to advance his research in polymer technology. His work has garnered attention for its potential applications in various industries, including electronics and materials science.
Collaborations
Eun-Ho has collaborated with notable colleagues, including Hong Suk Kang and Ju Hyeon Kim, to further enhance the impact of his research. Their combined expertise contributes to the development of innovative solutions in the field of chemical technology.
Conclusion
Eun-Ho Sohn's contributions to the field of fluorine-based polymers highlight his role as an influential inventor. His patented work not only addresses environmental concerns but also opens new avenues for technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
