Portland, OR, United States of America

Eugene Mino, Jr

This inventor holds 1 USPTO granted patent. Top assignee: Ateo Corporation. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eugene Mino, Jr. Retrieved from https://idiyas.com/inventor/eugene-mino-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: The Innovations of Eugene Mino, Jr.

Introduction

Eugene Mino, Jr. is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of lithography through his innovative designs and patents. His work has had a lasting impact on the industry, particularly with his focus on improving technology.

Latest Patents

Eugene Mino, Jr. holds a patent for an "On-axis air gage focus system." This invention is a lithography tool that features an enhanced focus system. The focus system includes a lens mounted in a nosepiece that defines a chamber. This chamber has an orifice through which the lens system can observe a workpiece. An air supply is integrated to provide a regulated and measured airflow to the chamber. By measuring the airflow into the chamber, the rate of air flow through the orifice can be determined. This rate is proportional to the gap between the orifice and the workpiece. He has 1 patent to his name.

Career Highlights

Eugene Mino, Jr. is currently employed at Ateo Corporation, where he continues to innovate and develop new technologies. His work at the company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his coworkers include Tim Thomas and Eric Christenson, who contribute to the collaborative environment at Ateo Corporation.

Conclusion

Eugene Mino, Jr. is a distinguished inventor whose work in lithography has led to significant advancements in technology. His patent for the on-axis air gage focus system exemplifies his innovative spirit and dedication to improving industry standards.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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