The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 1992
Filed:
Jan. 31, 1990
Applicant:
Inventors:
Tim Thomas, Beaverton, OR (US);
Eric Christenson, Portland, OR (US);
Bob Holstrom, Portland, OR (US);
Eugene Mino, Jr, Portland, OR (US);
Assignee:
Ateo Corporation, Beaverton, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D / ; G01M / ;
U.S. Cl.
CPC ...
346108 ; 73375 ;
Abstract
A lithography tool having an improved focus system. The focus system comprises a lens mounted in a nosepiece which defines a chamber. The chamber defines an onifice through which the lens system may see a workpiece. An air supply is provided to supply a regulated and measured air flow to the chamber. By measuring the air flow into the chamber, the rate of air flow through the orifice may be determined. The rate of air flow through the orifice is proportional to the gap between the orifice and a workpiece.