Company Filing History:
Years Active: 1977-1982
Title: Innovations of Eugene E Castellani
Introduction
Eugene E Castellani is a notable inventor based in Putnam Valley, NY (US). He has made significant contributions to the field of circuit fabrication, holding a total of 5 patents. His work primarily focuses on improving the methods of applying photoresist in electronic manufacturing processes.
Latest Patents
One of Castellani's latest patents is titled "Fine-line circuit fabrication and photoresist application therefor." This invention discloses a method for producing thick and smooth layers of photoresist, ranging from 2 to 15 microns thick. The process involves flooding the substrate with resist, followed by a drying time before spinning, which allows for the creation of fine line closely spaced circuitry with high aspect ratios. Another significant patent is "Variable pre-spin drying time control of photoresists thickness." This method involves applying resist to a surface using a syringe equipped with a millipore filter to ensure cleanliness. The resist is allowed to remain on the surface for a specific duration before spin coating, resulting in a uniform film.
Career Highlights
Eugene E Castellani is associated with the International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His expertise in photoresist application has been instrumental in advancing the technology used in circuit fabrication.
Collaborations
Throughout his career, Castellani has collaborated with notable coworkers, including Lubomyr Taras Romankiw and Aloysius T Pfeiffer. These collaborations have further enriched his work and contributed to the development of new technologies in the field.
Conclusion
Eugene E Castellani's contributions to the field of circuit fabrication and photoresist application have made a significant impact on the industry. His innovative patents and work at IBM highlight his role as a leading inventor in this specialized area.