The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 1982

Filed:

Dec. 28, 1977
Applicant:
Inventors:

Eugene E Castellani, Putnam Valley, NY (US);

Ian M Croll, Pleasantville, NY (US);

Aloysius T Pfeiffer, Peekskill, NY (US);

Lubomyr T Romankiw, Briarcliff Manor, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430314 ; 204 15 ; 1566591 ; 427160 ; 427346 ; 430318 ; 430323 ; 430324 ; 430327 ; 430330 ; 430935 ;
Abstract

A method is disclosed for the production of thick and smooth layers of photoresist on the order of 2-15 microns thick. The substrate is flooded with resist as in the standard spin resist method, but instead of following the flooding step with spinning as usual, the second step is to provide a drying time for the flooded resist. Then at the end of the measured drying time, the resist is spun as usual. This can be used to produce fine line closely spaced circuitry in which the thickness of the lines in proportion to their width, or their aspect ratio, is large. Aspect ratios greater than 0.4 and as high as 1.5 are contemplated by the invention.


Find Patent Forward Citations

Castellani, Eugene. (1982). Fine-line circuit fabrication and photoresist application therefor (U.S. Patent No. 4315985). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4315985

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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