This inventor holds 1 USPTO granted patent. Top assignee: Cabot Microelectronics Corporation. Active years: 2006.
Company Filing History:
Years Active: 2006
Title: Innovations of Ethan K Lightle
Introduction
Ethan K Lightle is an accomplished inventor based in Lostant, Illinois. He has made significant contributions to the field of polishing compositions, particularly in the context of semiconductor manufacturing. His innovative approach has led to the development of a unique method for polishing substrates that enhances the efficiency and effectiveness of the process.
Latest Patents
Ethan holds a patent for "Coated metal oxide particles for CMP." This invention provides a method of polishing a substrate, which includes several steps. The process involves providing a polishing composition, a substrate with at least one metal layer, and abrading a portion of the metal layer with the polishing composition. The polishing composition consists of an abrasive and a liquid carrier, where the abrasive includes metal oxide particles with a silane compound and a polymer adhered to it. Notably, the total amount of abrasive particles in the composition is limited to about 20% by weight, and the metal oxide particles do not include zirconia. This patent showcases Ethan's expertise and innovative thinking in the field.
Career Highlights
Ethan K Lightle is currently associated with Cabot Microelectronics Corporation, where he applies his knowledge and skills to advance polishing technologies. His work has been instrumental in developing solutions that meet the demands of modern semiconductor manufacturing processes. With a focus on innovation, Ethan continues to contribute to the field through his research and development efforts.
Collaborations
Ethan collaborates with talented individuals such as Fred Sun and Bin Lu. These partnerships enhance the creative process and lead to the development of cutting-edge technologies in the industry.
Conclusion
Ethan K Lightle is a notable inventor whose work in polishing compositions has made a significant impact on semiconductor manufacturing. His innovative patent and collaborations reflect his commitment to advancing technology in this field.