Company Filing History:
Years Active: 2013
Title: Erwine Maude Pargon: Innovator in Magnetic Tunnel Junctions
Introduction
Erwine Maude Pargon is a notable inventor based in Claix, France. She has made significant contributions to the field of semiconductor technology, particularly in the area of magnetic tunnel junctions. Her innovative methods have the potential to enhance the fabrication of devices on semiconductor substrates.
Latest Patents
Erwine Maude Pargon holds a patent for a "Method of patterning of magnetic tunnel junctions." This invention relates to methods for fabricating devices on semiconductor substrates. More specifically, it focuses on patterning magnetic materials. The method utilizes a reducing chemistry containing hydrogen gas or hydrogen-containing gas, with an optional dilution gas, at temperatures ranging from 20 to 300 degrees Celsius. The substrate bias is maintained at less than 1,000 DC voltage to minimize sputtering and redeposition. The use of an oxidizer-free gas mixture comprising hydrogen has been found to maintain the integrity of the magnetic tunnel junction without producing harmful conductive residue.
Career Highlights
Erwine is currently associated with Applied Materials, Inc., where she continues to advance her research and development efforts. Her work has been instrumental in improving the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Erwine has collaborated with notable colleagues, including Olivier Joubert and Benjamin Schwarz. These partnerships have fostered innovation and contributed to the success of her projects.
Conclusion
Erwine Maude Pargon is a pioneering inventor whose work in magnetic tunnel junctions exemplifies the intersection of creativity and technology. Her contributions to semiconductor fabrication are noteworthy and continue to influence the industry.