Traunstein, Germany

Erwin Spanner

This inventor holds 17 USPTO granted patents and 4 EPO patents, primarily in Optical Position Measurement. Top assignees: Dr. Johannes Heidenhain Gmbh, Johannes Heidenhain Gmbh. Active years: 1992-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Erwin Spanner. Retrieved from https://idiyas.com/inventor/erwin-spanner

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 82.4

 

Average Co-Inventor Count = 2.1

ph-index = 8

Forward Citations = 138(Granted Patents)


Company Filing History:


Years Active: 1992-2017

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Areas of Expertise:
Optical Position Measuring Device
Interferometer
Position Measuring System
Linear Encoder
Phase Grating
Photoelectric Position Measurement
Guidance Errors
Beam Splitter
Displacement Measuring
Reference Pulse
Optics System
Polarizing Interferometry
17 patents (USPTO):Explore Patents

Title: The Innovations of Erwin Spanner

Introduction

Erwin Spanner is a notable inventor based in Traunstein, Germany. He has made significant contributions to the field of optical measurement technology, holding a total of 17 patents. His work has advanced the understanding and application of optical position measuring devices and interferometers.

Latest Patents

One of Spanner's latest patents is an optical position measuring device. This device is designed to detect the relative position of two measuring standards that move relative to each other. It utilizes a splitting grating to divide a beam emitted by a light source into at least two partial beam bundles. These bundles undergo different polarization-optical effects as they travel through scanning beam paths. After recombination at a combination grating, the device generates multiple phase-displaced, displacement-dependent scanning signals. Notably, no polarization-optical components are placed in the scanning beam paths between the splitting and recombination stages.

Another significant patent is for an interferometer that includes a light source and a beam splitter. This interferometer splits the emitted beam into a measurement beam and a reference beam. The measurement beam travels through a measuring arm to a measuring reflector, which creates an offset perpendicular to the direction of incidence. The reference beam travels through a reference arm to a reference reflector. The interferometer is equipped with a detector system that generates a distance-dependent interference signal based on the position of the measuring reflector.

Career Highlights

Throughout his career, Erwin Spanner has worked with prominent companies such as Dr. Johannes Heidenhain GmbH and Johannes Heidenhain GmbH. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in optical measurement technology.

Collaborations

Spanner has collaborated with notable colleagues, including Wolfgang Holzapfel and Jürgen Thiel. These partnerships have fostered a creative environment that has led to advancements in their respective fields.

Conclusion

Erwin Spanner's contributions to optical measurement technology through his patents and collaborations highlight his innovative spirit and dedication to advancing the field. His work continues to influence the development of precise measurement devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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