Vaals, Netherlands

Erwin Eiling

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Osram Opto Semiconductors Gmbh. Active years: 2014.


% Patents Active = 100.0

 

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Erwin Eiling: Innovator in Material Deposition Technology

Introduction

Erwin Eiling is a notable inventor based in Vaals, Netherlands. He has made significant contributions to the field of material deposition technology, particularly through his innovative patent. His work has implications for various industries, including semiconductor manufacturing and optoelectronics.

Latest Patents

Eiling holds a patent for an "Arrangement for holding a substrate in a material deposition apparatus." This invention involves a sophisticated arrangement that includes a shadow mask with deposition openings and a support structure with surround openings. The design ensures that the shadow mask is positioned correctly between the substrate and the support structure, allowing for precise material deposition.

Career Highlights

Throughout his career, Erwin Eiling has worked with prominent companies in the industry. He has been associated with Osram Opto Semiconductors GmbH and Osram OLED GmbH, where he contributed to advancements in optoelectronic devices. His experience in these organizations has helped him refine his skills and innovate in the field.

Collaborations

Eiling has collaborated with notable professionals, including Johannes Krijne and Karl-Heinz Hohaus. These collaborations have likely enriched his work and contributed to the development of his patent.

Conclusion

Erwin Eiling's contributions to material deposition technology through his patent demonstrate his innovative spirit and expertise in the field. His work continues to influence advancements in various industries, showcasing the importance of inventors in driving technological progress.

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