Voorburg, Netherlands

Ernst Hammel

This inventor holds 1 USPTO granted patent. Top assignee: Ims-Ionen Mikrofabrikations Systeme Gmbh. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ernst Hammel. Retrieved from https://idiyas.com/inventor/ernst-hammel-yur83n4p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2000

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Ernst Hammel

Introduction

Ernst Hammel is a notable inventor based in Voorburg, Netherlands. He has made significant contributions to the field of microfabrication, particularly through his innovative patent. His work is recognized for its impact on the production of stencil masks, which are essential in various manufacturing processes.

Latest Patents

Ernst Hammel holds a patent for a "Method for the purpose of producing a stencil mask." This invention showcases his expertise in microfabrication techniques and highlights his commitment to advancing technology in this area.

Career Highlights

Hammel is currently employed at Ims-Ionen Mikrofabrikations Systeme GmbH, where he continues to develop and refine his innovative ideas. His role at the company allows him to collaborate with other experts in the field and contribute to cutting-edge projects.

Collaborations

Some of his notable coworkers include Hans Loschner and Ivaylo W Rangelow. Their collaboration fosters a creative environment that encourages the exchange of ideas and enhances the development of new technologies.

Conclusion

Ernst Hammel's contributions to the field of microfabrication through his patent and work at Ims-Ionen Mikrofabrikations Systeme GmbH exemplify his dedication to innovation. His collaborations with talented individuals further enrich the landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…