Ernst Eiper

Title: Innovations of Ernst Eiper

Introduction

Ernst Eiper is a notable inventor based in Graz, Austria. He has made significant contributions to the field of plasma etching, holding a total of 4 patents. His work focuses on improving the efficiency and precision of plasma dicing rates, which is crucial in various manufacturing processes.

Latest Patents

One of Ernst Eiper's latest patents is a method and system for regulating plasma dicing rates. This innovation addresses the challenge of over-etching by introducing an etch-resistant structure, such as a metal saw bow, in regions prone to this issue. By adjusting the dimensions of the saw bow legs and the area defined by them, as well as modifying the shape of the etch region through techniques like chamfering, the plasma etch speed can be controlled. This ensures that the etching speed in over-etched regions matches that of non-over-etched areas, enhancing the overall quality of the etching process.

Career Highlights

Ernst Eiper is currently employed at NXP B.V., a company known for its innovative solutions in the semiconductor industry. His work at NXP has allowed him to develop and refine his patented technologies, contributing to advancements in the field.

Collaborations

Throughout his career, Ernst has collaborated with talented individuals such as Christian Zenz and Antonius Hendrikus Jozef Kamphuis. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Ernst Eiper's contributions to plasma etching technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods continue to impact the industry positively.