The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Jun. 14, 2023
Applicant:
Nxp B.v., Eindhoven, NL;
Inventors:
Antonius Hendrikus Jozef Kamphuis, Nijmegen, NL;
Ernst Eiper, Graz, AT;
Johannes Cobussen, Beuningen, NL;
Chantal Claude Dijkstra, Veenendaal, NL;
Assignee:
NXP B.V., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/82 (2006.01); G01R 31/28 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/82 (2013.01); G01R 31/2831 (2013.01); G01R 31/2856 (2013.01); H01L 22/32 (2013.01); H01L 22/34 (2013.01);
Abstract
Speed of plasma etching is regulated in regions prone to over-etching by providing an etch resistant structure, such as a metal saw bow, in the region. By adjusting dimensions, such as the length and width of the saw bow legs and an area defined by the saw bow legs, as well as a shape of the etch region through techniques such as chamfering, plasma etch speed in the region can be controlled with an intent to match the speed of etching in non-over-etched regions.