Veenendaal, Netherlands

Chantal Claude Dijkstra


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2023-2024

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2 patents (USPTO):

Title: Celebrating Innovation: The Contributions of Chantal Claude Dijkstra

Introduction: Chantal Claude Dijkstra is an accomplished inventor based in Veenendaal, Netherlands, renowned for her innovative work in the field of plasma etching technology. With two patents to her name, Chantal exemplifies the spirit of innovation that drives progress in engineering and technology.

Latest Patents: Chantal's most recent patents focus on the method and system for regulating plasma dicing rates. Her invention addresses the challenge of controlling the speed of plasma etching in regions susceptible to over-etching. By incorporating an etch-resistant structure, such as a metal saw bow, in these regions, she allows for precise adjustments in the dimensions and shape of the etching area. This technique, which includes chamfering and modifications to the saw bow legs, ensures that plasma etch speed is harmonized across different regions, resulting in improved accuracy and efficiency in the etching process.

Career Highlights: Chantal currently works for NXP B.V., a leading company in the field of semiconductor technology. Her role involves applying her innovative approach to enhance manufacturing processes and contribute to the development of cutting-edge technologies. Her patents reflect her deep understanding of plasma etching and her commitment to advancing the industry.

Collaborations: In her career at NXP B.V., Chantal has worked alongside talented colleagues, including Ernst Eiper and Johannes Cobussen. Their collaborative efforts foster a dynamic environment of creativity and innovation, driving the development of intelligent solutions and enhancing productivity in their respective projects.

Conclusion: Chantal Claude Dijkstra stands out as a beacon of innovation in the technological landscape. Her contributions, particularly through her patents related to plasma dicing rates, not only showcase her expertise but also pave the way for future advancements in semiconductor manufacturing. Her journey highlights the importance of collaboration and continuous improvement in fostering a culture of innovation.

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