Chigasaki, Japan

Eriko Mase

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ulvac, Inc.. Active years: 2019.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Eriko Mase: Innovator in Thin Substrate Processing Technology

Introduction

Eriko Mase is a prominent inventor based in Chigasaki, Japan. She has made significant contributions to the field of substrate processing technology. Her innovative work has led to the development of a unique device that enhances the efficiency of thin substrate processing.

Latest Patents

Eriko Mase holds a patent for a "Thin substrate processing device." This device includes a substrate processing unit designed to process a thin substrate, along with a cooling unit that cools the thin substrate during processing. This innovation is crucial for improving the performance and reliability of thin substrates in various applications.

Career Highlights

Eriko Mase is currently employed at Ulvac, Inc., a company known for its advanced technology solutions. Her role at Ulvac has allowed her to focus on developing cutting-edge technologies that address the challenges in substrate processing. With her expertise, she has contributed to the company's reputation as a leader in the industry.

Collaborations

Throughout her career, Eriko has collaborated with notable colleagues, including Tetsushi Fujinaga and Masahiro Matsumoto. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Eriko Mase is a trailblazer in the field of thin substrate processing technology. Her patent and work at Ulvac, Inc. highlight her commitment to advancing this important area of research. Her contributions will undoubtedly continue to influence the industry for years to come.

Profile summary based on public USPTO records.
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