Company Filing History:
Years Active: 2010-2011
Title: Innovations by Erik Theander in Imprint Lithography
Introduction
Erik Theander is a notable inventor based in Lund, Sweden. He has made significant contributions to the field of imprint lithography, holding two patents that showcase his innovative approaches to pattern transfer technologies.
Latest Patents
The first of Erik Theander's latest patents is a method for imprint lithography at constant temperature. This invention involves transferring a pattern from a structured template to a substrate with a surface layer that solidifies upon exposure to radiation. The process includes arranging the template and substrate in parallel, heating them to a specific temperature, and then pressing the template against the substrate to imprint the pattern. Following this, the layer is exposed to radiation for solidification, and a postbaking step is performed.
The second patent focuses on pattern replication with an intermediate stamp. This two-step process begins with creating a flexible polymer stamp from the template. The polymer stamp is then used to imprint a radiation-sensitive layer on the target surface. All steps, including pressing the stamp against the substrate, UV exposure, and postbaking, are conducted at a controlled constant temperature to prevent damage to the pattern from thermal expansion effects.
Career Highlights
Erik Theander is associated with Obducat AB, a company known for its advancements in lithography technologies. His work has contributed to the development of innovative solutions in the field, enhancing the capabilities of imprint lithography.
Collaborations
Erik collaborates with notable colleagues such as Babak Heidari and Erik Bolmsjö. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Erik Theander's contributions to imprint lithography through his patents demonstrate his commitment to advancing technology in this field. His innovative methods are paving the way for future developments in pattern transfer techniques.